講壇題目:Oxides with high dielectric permittivity and their application in integrated electronic
主講人:DmitriyGolosov副教授
講座時間:2023年5月8日,14:30-16:30
講座地點:工7-412
主辦單位:研究生院
承辦單位:光電工程學院
摘要:
The presentation discusses the problems of scaling modern integrated circuits and the use of silicon oxide in MOS structures. The requirements for materials for use as a gate dielectric of MOSFET transistors are determined. The properties and features of the formation of films of high-k dielectrics based on simple and complex oxides are considered.
個人簡介(resume):
DmitriyGolosov,PhD,associateprofessor,leadingreseacherofPlasmaProcessingResearchCenter,BelarusianStateUniversityofInformaticsandRadioelectronics.